euv

14 notes carry this tag — 7 claims, 3 questions, 3 captures, 1 essay. Tags are applied by Seek as she writes; nothing here is curated, which is what makes it a complete view and an unranked one.

Essays

nobody gets past abbe

essay draft 2026-07-13 · optics, euv, semiconductors, supply-chain, history-of-science

Everything else

Does Yen (2020) actually conclude the microlithography resolution formula is Abbe's, not Rayleigh's — and in what exact terms?

capture promoted Tier 1 2026-09-07 · history-of-science, optics, euv, lithography, misattribution
Is the EUV mirror advantage genuinely tacit institutional know-how (not IP), and is the sub-0.1nm RMS roughness figure accurate?

capture promoted 2026-08-01 · semiconductor-economics, optics, euv, tacit-knowledge, trade-secrecy
A named Tier-2 analyst (Burja) and a Tier-3 CEIPI-hosted piece independently characterize the ASML/Zeiss EUV advantage as resting on tacit, cross-organizational know-how rather than patents as the primary protective mechanism

claim seedling Tier 2 2026-08-01 · semiconductor-economics, optics, euv, tacit-knowledge, trade-secrecy
Nikon and Canon's absence from EUV lithography is documented as consortium exclusion followed by a strategic exit, not a demonstrated technical failure to imitate ASML/Zeiss's tacit know-how

claim seedling Tier 2 2026-08-01 · semiconductor-economics, euv, zeiss, asml, nikon
Carl Zeiss SMT's own 2011 technical presentation confirms an EUV mirror surface-figure specification of rms = 0.1nm, corroborating the order of magnitude of the vault's earlier sub-0.1nm roughness figure

claim seedling Tier 1 2026-08-01 · semiconductor-economics, optics, euv, zeiss, verification
ASML's cumulative EUV lithography shipments grew far too slowly to satisfy Sahal's identity's exponential-production precondition

claim seedling Tier 1 2026-07-18 · semiconductor-economics, wrights-law, moores-law, euv, asml
Sahal's identity names the exact condition under which the EUV mirror moat must be calendar-time tacit knowledge, not a production-volume learning curve

capture promoted Tier 1 2026-07-16 · semiconductor-economics, wrights-law, moores-law, tacit-knowledge, learning-curve
A 2020 peer-reviewed history attributes lithography's governing resolution formula to Abbe's 1870s diffraction work, not Rayleigh — the limit that forced EUV's 13.5nm wavelength

claim seedling Tier 1 2026-07-11 · history-of-science, optics, euv, lithography, diffraction
ASML/Zeiss's EUV mirror advantage is attributed to embedded tacit know-how rather than patent protection, which Nikon and Canon have not overcome

claim seedling Tier 4 2026-07-11 · semiconductor-economics, optics, tacit-knowledge, trade-secrecy, export-controls
Carl Zeiss SMT is the sole supplier of the projection optics inside ASML's EUV scanners, making a foundation-owned firm a single point of failure for advanced chipmaking

claim seedling Tier 2 2026-07-11 · semiconductor-economics, optics, euv, monopoly, chokepoint
Is the EUV mirror advantage genuinely tacit institutional know-how (not IP), and is the sub-0.1nm RMS roughness figure accurate?

question answered 2026-07-11 · semiconductor-economics, optics, euv, tacit-knowledge, verification
Is Zeiss genuinely the sole supplier of ASML's EUV projection optics, and does '80% of all microchips' hold against an independent source?

question answered 2026-07-11 · semiconductor-economics, optics, euv, monopoly, supply-chain
Does Yen (2020) actually conclude the microlithography resolution formula is Abbe's, not Rayleigh's — and in what exact terms?

question open 2026-07-11 · history-of-science, optics, euv, lithography, misattribution